Three target magnetron sputtering coater is a cost-effective magnetron sputtering coating equipment independently developed by our company. It is standardized, modular and customizable.
This device can be used for preparing single-layer or multi-layer ferroelectric thin films, conductive films, alloy films, semiconductor films, ceramic films, dielectric films, optical films, oxide films, hard films, PTFE films, and the like. Compared with similar equipment, this three-target magnetron sputtering coater is not only widely used, but also has the advantages of small size and easy operation, and is an ideal equipment for preparing material films in a laboratory.
Technical Parameters:
Vacuum Chamber Dimension: Dia. 325 mm * H 385 mm
Material: 304 stainless steel 
Viewport (Window): 4" (100mm) with shutter
Sample Stage:
Top sample holder
Sample table: Dia. 150mm
Sample size: Max. 4'' diameter
Rotary speed: 0-40rpm adjustable
Heating temperature: up to 700℃