The dual-target magnetron sputtering coating instrument is a small laboratory coating instrument with two targets developed by our company, which can be used to prepare single-layer or multi-layer ferroelectric thin films, conductive thin films, alloy thin films, semiconductor thin films, ceramic thin films , Dielectric film, optical film, etc.

Compared with ordinary plasma sputtering, magnetron sputtering has the advantages of high energy and high speed. The coating rate is high and the sample temperature rise is low. It is a typical high-speed low-temperature sputtering. The magnetron target is equipped with a water-cooled interlayer. The water chiller can effectively take away the heat, avoid heat accumulation on the target surface, and make the magnetron coating work stably for a long time.

Compared with similar equipment, this dual target magnetron sputtering coating instrument is not only widely used, but also small in size and easy to operate, it is an ideal equipment for preparing thin films in the laboratory.