RTP rapid annealing furnace is a powerful heating equipment independently developed by our company. The RTP rapid annealing furnace is heated by imported infrared heating tube. The shape is novel and the structure is reasonable. The furnace body and the furnace tube can slide freely, which can realize rapid temperature rise and fall. The size of furnace tube is 120mm
, which can directly place 4 inches of materials. The reaction zone of the sample is in a closed quartz chamber, which greatly reduces the possibility of indirect contamination of the sample while completing the production process. The device is equipped with LCD high-definition touch screen, and the setting data experiment operation is all graphic interface. It is convenient and quick to operate, which can greatly improve your experiment efficiency. The equipment has reserved the quick interface for vacuum and air gases, and our vacuum system can be used together with the gas mixing system.
RTP rapid annealing furnace application range:
Rapid annealing furnace equipment can be used for rapid thermal annealing, rapid thermal oxidation, rapid thermal nitridation, silicidation, diffusion, compound semiconductor annealing, post-ion implantation annealing, electrode alloying, crystallization and densification, alloy melting point analysis, thin film deposition, and the like.