This product is a plasma-enhanced rotary chemical vapor deposition system (rotating PECVD). The furnace tube adopts a variable-diameter design. The middle tube diameter is relatively thick and there are mixing partitions, which can repeatedly mix powder or particles with the rotation of the furnace tube. The working tube can be rotated 360° uninterruptedly through the mechanical transmission control, so that the materials in the tube can be stirred and mixed to obtain a uniform heating effect; the equipment is also equipped with a plasma generator, which is connected to the furnace tube by inductive coupling, and the generated plasma can cover the furnace tube effectively, increase the activation energy of the reactants, reduce the reaction temperature, and improve the reaction efficiency. The equipment is equipped with a three-way mass flow meter and a gas mixing device, which can be used to pass a variety of gases into the pipe. At the same time, the equipment is equipped with a high-performance mechanical pump that can quickly evacuate the furnace pipe to vacuum; the cooperation of the pump and the gas circuit can achieve more CVD processes. The rotating device is very suitable for continuously coating and modifying powder materials by CVD method in an atmosphere protected environment.