This equipment is a wafer level large-size molybdenum disulfide preparation device designed based on CVD principles. It includes a three-zone tube furnace, a specially designed furnace tube and a set of supporting gas circuits. The equipment can uniformly release the reaction gas into the furnace tube through a specially designed pipeline to ensure the consistency and uniformity of the product on the back-end wafer. It is the best choice for molybdenum disulfide preparation experiments.
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