The equipment uses electron beam evaporation as coating equipment. It is mainly used to prepare various conductive thin films, semiconductor thin films, ferroelectric thin films, optical thin films, micro-fabrication of micro and nano devices, sample pretreatment of electron microscopy, etc. It is especially suitable for evaporating various refractory metal materials. It can be used not only on hard substrates such as glass and silicon wafers, but also on flexible substrates such as PDMS, PTFE and PI.

Technical parameters：

Evaporation chamber size: Phi 500 *H500
Electronic gun:a new type of electronic gun, 6-hole crucible
Sample turntable    
Sample size: <150mm, sample can be rotated, and the distance between sample and electron gun can be adjusted up and down (Sample holder shape is designed according to user's requirements), heating temperature <500℃.
System Vacuum    
Limit vacuum: baked for 12 to 24 hours, continuously pumped less than 5x10-5Pa
Pumping Rate: Vacuum < 5x10-4Pa within 40 minutes from atmospheric start
System Leakage Rate: Measuring Vacuum Vacuum Degree of Vacuum Chamber < 10Pa after 12 hours of shutdown
Please contact us by email for details.