This machine is a cost-effective plasma sputter coating equipment independently developed by our company. It has the advantages of compact structure, easy to use, high integration and strong sense of design. The plasma sputtering target is a standard size of 2 inches. Customers can choose different configurations of 1~3 targets according to their needs to meet the different experimental needs of single-layer film or multilayer films of various materials.
The instrument is equipped with 150W DC high-voltage power supply, which can be used for metal sputter coating, especially for the coating of metals such as gold, silver and copper. This film coater is equipped with a gas connection for the introduction of protective gas. If the customer needs to pass the mixed gases, the staff can be contacted to configure the high-precision mass flow meter to meet the experimental needs.

Application：
It can be used for metal sputter coating, especially for metal coatings such as gold, silver and copper.